Интернаука №16 ((часть2) 2020 - [11]

Приложение 7

United States Patent Application

20180133677

Kind Code

A1

KIM; Ju Hee

May 17, 2018

APPARATUS FOR A MASS PRODUCTION OF MONODISPERSE BIODEGRADEABLE POLYMER-BASED

MICROSPHERES AND A MULTI-CHANNEL FORMING DEVICE INCORPORATABLE THEREIN

Abstract

Provided is an apparatus for a mass production of microspheres and a multichannel forming device incorporatable therein. The apparatus comprises a multi-channel microsphere forming unit, a first source material reservoir containing the first source material and in fluid communication with the plurality of first microchannels, a second source material reservoir containing the second source material and in fluid communication with the plurality of second microchannels, a flow control unit configured to supply a first gas to the first source material reservoir at a first source material flow rate and to supply a second gas to a second source material reservoir at a second source material flow rate and a product reservoir for accommodating the microspheres formed from the multi-channel forming unit.

25

Журнал «Интернаука»

№ 16 (145), часть 2, 2020 г.

Приложение 8

United States Patent Application

20150066592

Kind Code

A1

Ehm; Hans; et al.

March 5, 2015

METHODS OF SEMICONDUCTOR MANUFACTURING AND SUPPLY CHAIN MANAGEMENT SYSTEMS

Abstract

In various embodiments, a method of semiconductor manufacturing is provided. The method may include: gathering information impacting production of semiconductor goods via a computer network platform; gathering information from a social networking platform via an interface of the computer network platform to the social networking platform; modelling at least one agent of a manufacturing entity in carrying out its tasks to manufacture semiconductor goods; and determining manufacturing capacity of the manufacturing entity as a function of at least the gathered information impacting the production of semiconductor goods, the gathered information from the social networking platform and the modelled agent.

Приложение 9

United States Patent Application

20080008837

Kind Code

A1

SHIBA; Yasuhiro; et al.

January 10, 2008

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD FOR HEAT-TREATING SUBSTRATE

Abstract

A substrate coated with a coating solution for an anti-reflective film is placed on a heat treatment plate and is heat-ed. Nitrogen gas flows near the periphery of the heat treatment plate into a heat treatment space. An exhaust outlet is formed in an upper central portion of an inner cover, and the inner cover has an inner wall surface configured in the form of a tapered surface. This produces a smooth flow of nitrogen gas along the tapered surface to smoothly discharge a sublimate produced from the coating solution together with the gas flow outwardly through the exhaust outlet. After the heating process for a predetermined period of time is completed, the cover moves upwardly, and support pins move upwardly to thrust up the substrate from the heat treatment plate, thereby spacing the substrate apart from the heat treatment plate. This gradually decreases the temperature of the substrate. The substrate is placed in a standby condition within a hot plate in this state until the substrate temperature is decreased down to at least a temperature at which the

production of the sublimate from the anti-reflective film after firing stops, and thereafter a transport robot transports the substrate out of the hot plate.

Приложение 10

United States Patent Application

20050264777

Kind Code

A1

Gardner, Steven D.; et al.

December 1, 2005

High speed lithography machine and method

Abstract

A machine and method for high speed production of circuit patterns on silicon wafers or similar substrates may be used for applications including printing Integrated Circuit (IC) packaging patterns onto wafers prior to separating IC

chips. Projection camera(s) simultaneously project image(s) onto substrate(s) carried on an X, Y,.theta. stage. The projection camera(s) may include independent alignment systems, light sources, and control of focus, image placement, image size, and dose. In one embodiment, each camera inlcudes a 6-axis reticle chuck that moves a reticle to correct image-to-substrate overlay errors. In-stage metrology sensors and machine software establish and maintain the correct relationship among the machine's coordinate systems. Thus, two or more projection cameras can print simultaneously even when substrates are slightly misplaced on the X, Y,. theta. stage.

26

Журнал «Интернаука»

№ 16 (145), часть 2, 2020 г.

МЕТОДЫ ИЗВЛЕЧЕНИЯ ГАЛЛИЯ ИЗ ПРОМПРОДУКТОВ

АЛЮМИНИЕВОГО ПРОИЗВОДСТВА

Несмеянова Римма Михайловна

канд. хим. наук, профессор, Павлодарский Государственный Университет имени С. Торайгырова,Республика Казахстан, г. Павлодар

Скибра Евгений Иванович

магистрант, Павлодарский Государственный Университет имени С. Торайгырова,Республика Казахстан, г. Павлодар

Для обработки алюминиевых руд используется в

изменение длительности процесса и увеличение